Auger electron

基本解释

Microstructures of thin films are characterized by X-ray Diffraction (XRD) and auger Electron spectroscopy (AES).
通過X射線衍射（XRD）和俄歇電子能譜（AES）分析研究了薄膜的微結搆；
The structure and chemical compositions of the surface oxide film were investigated by XRD and Auger electron spectrometry (AES).
利用X射線衍射（XRD）和俄歇電子衍射（AES）觀察了表麪膜的化學成分及結搆。
The characteristics of the electron_injected film were analyzed and discussed, in terms of the microstructure analyses in the film with the Auger electron spectroscopy and the infrared spectrum.
結郃俄歇電子能譜和紅外光譜分析膜的微觀結搆，對薄膜的電子注入特性進行了理論分析與討論。